Polysilicon Cvd Process
Semi Conductor Industry
Temperature is a critical parameter that directly affects the growth and quality of the deposited polysilicon film. Accurate temperature measurement allows for precise control of the deposition process. By monitoring and adjusting the temperature, operators can optimize the growth rate, crystal structure, and electrical properties of the polysilicon film.
Polysilicon Cvd Process
A fiber optic Ratio (two colour) pyrometer is used to measure the temperature of the substrate or the deposited polysilicon film. Fiber optic pyrometers are compact in size and have flexible optical fibers.
A 450C+ FO/PL is highly accurate ratio pyrometer with fibre optic and optical head. It has inbuilt temperature display and parameterising keys. Small spot size ensures high precision temperature measurement.
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